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Microstructure and composition design of magnetic Ni-Mn-Sn Co-sputter deposited films
ARIS QUINTANA NEDELCOS
JOSE LUIS SANCHEZ LLAMAZARES
Tupak García_Fernández
Acceso Abierto
Atribución-NoComercial-SinDerivadas
https://doi.org/10.9734/JSRR/2015/16672
Ni-Mn-Sn
Magnetic shape memory alloys
Sputtering
co-sputtering deposition
"In this work, we study the effect of the substrate temperature (ST) during sputter-deposition as well as co-sputtering deposition on the fabrication of nanostructured Ni-Mn-Sn thin films. Sputtered films show Mn losses of around 10 at.% while the average grain size (<d>) increased from 30 nm to 105 nm with the increasing of ST. Mn losses compensation is proposed by co-sputtered deposition. With such a purpose a variable electrical power was applied to the radio frequency (RF) Mn cathode. By increasing the electrical power applied to the RF Mn cathode both Mn and Ni contents approach to the targeted nominal composition Ni:Mn:Sn = 50:37:13. Elemental chemical composition analyses show that the composition varied between Ni61.5Mn26.2Sn12.3 and Ni54.6Mn30.5Sn14.9 when the applied RF-power increased from 0 W to 30 W."
SCIENCEDOMAIN international
2015
Artículo
Inglés
Público en general
A. Quintana-Nedelcos, J. L. Sanchez-Llamazares, T. García-Fernández, S. Guvenc, M. Yumak & C. García. (2015). Microstructure and Composition Design of Magnetic Ni-Mn-Sn Co-sputter Deposited Films. Journal of Scientific Research and Reports, 6, 476-482. DOI : 10.9734/JSRR/2015/16672
FÍSICA
Versión publicada
publishedVersion - Versión publicada
Aparece en las colecciones: Publicaciones Científicas Nanociencias y Materiales

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